Symposium Schedule
(The program is subject to change)
- AEC/APC Symposium Asia 2017 Poster Session
Schedule of Presentations and Speakers
9:15 | Registration Starts / Door Open |
9:30 | Opening Remarks from AEC/APC Asia Hidetaka Nishimura Renesas Electronics |
9:35 | Program Outline Hidenori Kakinuma Toshiba Memory |
Session Chair: Takahiro Tsuchiya, MIE Fujitsu Semiconductor | |
9:40 | Tutorial-1 Data driven approach for Prognostics and Health ManagementProf. Makoto Imamura Tokai University |
Session Co-chairs: Toshiya Hirai, Murata Manufacturing / Takashi Kurosawa, Azbil | |
10:25 | [DA-22] Sparse Modeling for Automatic Extraction of Variables to build accurate Virtual Metrology Models Yuri ISHIZAKI University of Tsukuba View Abstract |
10:45 | [DA-18] Intelligent Causal Analysis System for Wafer Quality Control using Sparse Modeling Masaaki Takada Toshiba View Abstract |
11:05 | [MT-10] Robust FDC based on gray box model Yuko Jisaki Panasonic Industrial Devices Engineering View Abstract |
11:25 | [MT-23] Deep learning to achieve a new anomaly detection method Takayoshi Konatsu Sony Semiconductor View Abstract |
11:45 | Lunch Break & Supplier Exhibition |
Short Presentation for interactive poster seesion(12:40~12:55) Session Chair: Shunichi Shibuki, Sony Semiconductor Manufacturing |
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12:40 | Introduction for Posters ( 3mins Summary Presentation ) |
[BE-21] Study on manufacturing of patterned graphene by electron beam irradiation method Shotaro Kuzukawa / Koki Matsumasa Kumamoto University View Abstract |
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[PO-20] Non-Destructive Surface States Density Measurement by Pulse Photoconductivity Method Shotaro Kuzukawa / Takahiro Ono Graduate School of Science and Technology Kumamoto University View Abstract |
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[DA-24] Study on wind direction and wind velocity measurement method Shotaro Kuzukawa / Ryoma Katayama Kumamoto University View Abstract |
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[MT-12] Practical Approach to Further Reducing False Alarms in Dynamic Fault Detection Tom Ho BISTel View Abstract |
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Session Chair: Hidenori Kakinuma, Toshiba Memory | |
12:55 | Keynote Advanced equipment and process control technology enabling sustainable scaling of semiconductor devicesToshihiko Nishigaki Tokyo Electron |
Session Co-chairs: Tomoya Tanaka, TowerJazz Panasonic Semiconductor / Hisato Tanaka, Tokyo Electron | |
13:40 | [MT-15] Per shot Focus & Tilt-XY correction technology for improving focus performance of lithography Shinji Eto Toshiba Memory View Abstract |
14:00 | [MT-11] Effective Normalized Response Function in controlled systems Naotoshi Taniguchi Azbil View Abstract |
14:20 | [BA-13] Real-time Wafer Inventory Quality Assessment Using FDC Data Tom Ho BISTel View Abstract |
14:40 | [MT-16] E-Diagnostics and FDC Implementation on Process Equipment Eric Dunton, Keishi Sonoda TEL NEXX, Inc. View Abstract |
15:00 | Supplier Exhibition / Coffee Break |
Session Chair: Hidetaka Nishimura, Renesas Electronics | |
15:40 | Tutorial-2 Active monitoring in SPC of Semiconductor Manufacturing ProcessesProf.Ken Nishina Nagoya Institute of Technology |
Session Co-chairs: Koichi Sakamoto, Tokyo Electron / Hirofumi Tsuchiyama, Renesas Semiconductor Manufacturing | |
16:25 | [IN-28] Process Flow Artificial Intelligent for Highly Diversified Products in Pure Foundry Wafer Fab Kimmy Ang Global Foundries View Abstract |
16:45 | [MT-14] The Advanced Monitoring Method for the Residual Charge in Wafer Tsuyoshi Yokogaki Renesas Semiconductor Manufacturing View Abstract |
17:05 | [PO-19] Evaluation of trace of metal contamination in silicon dioxide film by Pulse Photoconductivity Method Shotaro Kuzukawa Graduate School of Science and Technology Kumamoto University View Abstract |
17:25 | [TD-17] Highly durable smart capacitance manometer with fault detection functions Masaru Soeda Azbil View Abstract |
18:00 | Reception (Poster Session / Author's Interview/ Supplier Exhibition) Koichi Sakamoto, Tokyo Electron |
18:30 | Closing Remarks & Best Poster Award & Best Paper Award and Student Award Hidenori Kakinuma, Toshiba Memory |
19:30 | Closing |