プログラムスケジュール
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- AEC/APC Symposium Asia 2017 Poster Session
9:15 | Registration Starts / Door Open |
9:30 | Opening Remarks from AEC/APC Asia Hidetaka Nishimura Renesas Electronics |
9:35 | Program Outline Hidenori Kakinuma Toshiba Memory |
Session Chair: Takahiro Tsuchiya, MIE Fujitsu Semiconductor | |
9:40 | Tutorial-1 機器・設備予知保全におけるデータ分析方式についてProf. Makoto Imamura Tokai University |
Session Co-chairs: Toshiya Hirai, Murata Manufacturing / Takashi Kurosawa, Azbil | |
10:25 | [DA-22] スパースモデリングによる自動変量抽出と高精度な仮想検査モデルの構築 Yuri ISHIZAKI University of Tsukuba View Abstract |
10:45 | [DA-18] スパースモデリングによるウェハ品質管理のための自動要因解析システム Masaaki Takada Toshiba View Abstract |
11:05 | [MT-10] グレーボックスモデルによるロバストFDC Yuko Jisaki Panasonic Industrial Devices Engineering View Abstract |
11:25 | [MT-23] 深層学習による新しい異常検出手法の確立 Takayoshi Konatsu Sony Semiconductor View Abstract |
11:45 | Lunch Break & Supplier Exhibition |
Short Presentation for interactive poster seesion(12:40~12:55) Session Chair: Shunichi Shibuki, Sony Semiconductor Manufacturing |
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12:40 | Introduction for Posters (3mins Summary Presentation ) |
[BE-21] 電子線照射によるパターニンググラフェン作製に関する研究 Shotaro Kuzukawa / Koki Matsumasa Kumamoto University View Abstract |
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[PO-20] パルス光伝導法による非破壊界面準位密度測定 Shotaro Kuzukawa / Takahiro Ono Graduate School of Science and Technology Kumamoto University View Abstract |
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[DA-24] クリーンルームにおける相関法を用いた風向風速測定法に関する研究 Shotaro Kuzukawa / Ryoma Katayama Kumamoto University View Abstract |
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[MT-12] Practical Approach to Further Reducing False Alarms in Dynamic Fault Detection Tom Ho BISTel View Abstract |
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Session Chair: Hidenori Kakinuma, Toshiba Memory | |
12:55 | Keynote 半導体デバイスの微細化継続を可能とする装置制御技術Toshihiko Nishigaki Tokyo Electron |
Session Co-chairs: Tomoya Tanaka, TowerJazz Panasonic Semiconductor / Hisato Tanaka, Tokyo Electron | |
13:40 | [MT-15] リソグラフィのフォーカス性能向上のためのショット毎Focus&Tilt-XY補正技術 Shinji Eto Toshiba Memory View Abstract |
14:00 | [MT-11] 制御システムにおける効果的な正規化応答性の活用 Naotoshi Taniguchi Azbil View Abstract |
14:20 | [BA-13] Real-time Wafer Inventory Quality Assessment Using FDC Data Tom Ho BISTel View Abstract |
14:40 | [MT-16] E-Diagnostics and FDC Implementation on Process Equipment Eric Dunton, Keishi Sonoda TEL NEXX, Inc. View Abstract |
15:00 | Supplier Exhibition / Coffee Break |
Session Chair: Hidetaka Nishimura, Renesas Electronics | |
15:40 | Tutorial-2 半導体製造工程における能動的な管理図管理Prof.Ken Nishina Nagoya Institute of Technology |
Session Co-chairs: Koichi Sakamoto, Tokyo Electron / Hirofumi Tsuchiyama, Renesas Semiconductor Manufacturing | |
16:25 | [IN-28] Process Flow Artificial Intelligent for Highly Diversified Products in Pure Foundry Wafer Fab Kimmy Ang Global Foundries View Abstract |
16:45 | [MT-14] The Advanced Monitoring Method for the Residual Charge in Wafer Tsuyoshi Yokogaki Renesas Semiconductor Manufacturing View Abstract |
17:05 | [PO-19] パルス光伝導法によるシリコン酸化膜中の微量金属汚染評価 Shotaro Kuzukawa Graduate School of Science and Technology Kumamoto University View Abstract |
17:25 | [TD-17] サファイア隔膜真空計による安定計測と異常検知の可能性 Masaru Soeda Azbil View Abstract |
18:00 | Reception (Poster Session / Author's Interview/ Supplier Exhibition) Koichi Sakamoto, Tokyo Electron |
18:30 | Closing Remarks & Best Poster Award & Best Paper Award and Student Award Hidenori Kakinuma, Toshiba Memory |
19:30 | Closing |